工藝技術(shù)無(wú)損檢測(cè)工藝規(guī)程液體滲透_第1頁(yè)
工藝技術(shù)無(wú)損檢測(cè)工藝規(guī)程液體滲透_第2頁(yè)
工藝技術(shù)無(wú)損檢測(cè)工藝規(guī)程液體滲透_第3頁(yè)
工藝技術(shù)無(wú)損檢測(cè)工藝規(guī)程液體滲透_第4頁(yè)
工藝技術(shù)無(wú)損檢測(cè)工藝規(guī)程液體滲透_第5頁(yè)
已閱讀5頁(yè),還剩4頁(yè)未讀, 繼續(xù)免費(fèi)閱讀

下載本文檔

版權(quán)說(shuō)明:本文檔由用戶提供并上傳,收益歸屬內(nèi)容提供方,若內(nèi)容存在侵權(quán),請(qǐng)進(jìn)行舉報(bào)或認(rèn)領(lǐng)

文檔簡(jiǎn)介

1、NJBST Co.,Ltd.QCD-015Rev.:0Page:1 of 8Title: PROCEDURE FOR LIQUID PENETRANT EXAMINATIONPROCEDURE FOR LIQUID PENETRANT EXAMINATION液體滲透檢驗(yàn)工藝規(guī)程CONTROLLED在控本口UNCONTROLLED 非在控本口 COP Y NO副本編號(hào):PREPARED BY 編制:DATE日期:REVIEWED BY 審核:DATE日期:APPROVED BY 批準(zhǔn):DATE日期:NJBST Co.,Ltd.QCD-015Rev.:0Page:2 of 8Title: PROC

2、EDURE FOR LIQUID PENETRANT EXAMINATIONDEMONSTRATION CERTIFICATIONThis is to certify that this procedure has bee n dem on strated on a test specimen with known defects to the satisfaction of the Authorized Inspector according to ASME Code Section V , T-150 as required by the Section 忸 Div.1, Appe ndi

3、x 8.Test Specime n No.:Demo. Report No.:NDE Level 川:AI:Manu facturerMaterialModelSha nghai(Ship Brand)Pen etra ntHD-RSDeveloperHD-XSClea ning Age ntHD-BXTable 3.21 . 1本規(guī)程適用于 ASME規(guī)范產(chǎn)品金 屬材料和焊件著色液體滲透檢驗(yàn)。1. 2本規(guī)程僅適用于探測(cè)材料或焊件 表面開(kāi)口類缺陷。1. 3本規(guī)程在執(zhí)行之前,須演示至AI滿意。2. 人員2.1從事液體滲透檢驗(yàn)的人員必須是 根據(jù)南京定色鈦業(yè)有限公司 (資 料號(hào):QCD-011)進(jìn)行

4、考試和資格任命的 合格人員。3. 滲透材料3.1滲透材料包括檢驗(yàn)過(guò)程中使用的 所有滲透劑、溶劑或清洗劑、顯像劑等。 in 3.2液體滲透探傷材料,必須是指定 的和推薦的,見(jiàn)表 3.2。檢驗(yàn)使用的材 料必須是同一類型的。不允許用不同類 型的或不同制造廠的滲透材料混合使 用表3.2制造廠材料牌號(hào)上海滬 船助劑廠滲透劑HD-RS顯像劑HD-XS清洗劑HD-BX3.3當(dāng)檢驗(yàn)奧氏體不銹鋼或鈦材時(shí), 必 須根據(jù)ASME規(guī)范第V卷T-641(b)中的程序,對(duì)所有材料分別分析氯和氟的含 量。殘留氯和氟總含量不得超過(guò)殘留物 重量的1%,必須有制造廠相應(yīng)的合格 證。3.4當(dāng)檢查鎳基合金時(shí),必須按照 ASME規(guī)范第

5、V卷T-641(a)中的程序, 對(duì)所有材料分別分析硫含量。硫含量不 得超過(guò)殘留物重量的 1%必須有制造廠 相應(yīng)的合格證。NJBST Co.,Ltd.QCD-015Rev.:0Page:3 of 8Title: PROCEDURE FOR LIQUID PENETRANT EXAMINATION1. General1.概述1.1 This procedure is applied to dye liquid penetrant exam in atio n of metal material and weldme nt for ASME Code items.1.2 This procedure

6、 is only suitable for detecting the defects that are ope n to the surface of material or weldme nt.1.3 This procedure shall be dem on strated to the satisfaction of the AI prior to implementation.2. Pers onnel2.1 The pers onnel en gaged in the pen etra nt exam in atio n shall be qualified and certif

7、ied in accordanee with the requireme nt of NJBST Co., Ltd. “ Written Practice for NDE Pers onnel Trai ning Exam in ati on, Qualificati on and Certification ”(No.-QCQ.3. Pe netra nt Materials3.1 The penetrant materials is intended to include all pen etra nts, solve nts or clea ning age nts, developer

8、s, etc, used the exam in ati on process.3.2 The liquid pen etra nt exam in atio n materials shall be designated and recommended, as shown in Table 3.2. The materials used for exam in ati on shall be the same type. Intermixing of penetrant materials from different families or differe nt manu facturer

9、s is not permitted.3.3 Whe n exam ining auste nitic sta ini ess steel or tita nium, all materials shall be analyzed individually for chlorine and fluorine content in accordanee with the procedure shown in T-641(b) of ASME Code Section V. The total chlorine plus fluori ne content shall not exceed 1%o

10、f the residue by weight. The certificate of complianee from manufacturer shall be obta in ed.3.4 When exam ining ni ckel base alloys, all materials shall be analyzed individually for sulphur content in accordanee with the procedure shown in T-641(a) of Section VThe sulphur content shall not exceed 1

11、%of the residue by weight. The certificate of complia nee from manu facturer shall be obta in ed.Title: PROCEDURE FOR LIQUID PENETRANT EXAMINATION4. Exam in ati on Procedure4.檢驗(yàn)程序4.1檢驗(yàn)程序流程圖見(jiàn)圖4.14.1 Exam in ati on Flow Chart as show n in Fig.4.1.NJBST Co.,Ltd.QCD-015Rev.:0Page:8 of 8所有滲透檢驗(yàn)前,被檢工件表面及其附

12、近至 少為1英寸(25.4mm)的區(qū)域內(nèi)都應(yīng)干燥清洗 干凈,不得有任何臟物、纖維屑、氧化皮、 焊劑、油和其它外來(lái)物。必要時(shí),應(yīng)對(duì)表面 進(jìn)行打磨或機(jī)加工。d 4.3預(yù)清洗4.3.1在施加滲透劑之前,被檢區(qū)域及其附 近至少為1英寸(25.4mm)的區(qū)域內(nèi)均需用清 潔劑進(jìn)行清洗。4.3.2清洗后,通過(guò)適當(dāng)?shù)姆椒?自然揮發(fā)或人工通風(fēng)),對(duì)被檢表面進(jìn)行干燥;最少干燥 的時(shí)間以保證在施加滲透劑之前清潔劑已完 全揮發(fā)為界。4.4施加滲透劑4.4.1可以用浸漬、涂刷或噴涂等任一合適 的方法,在被檢工件4.2 Surface Preparati onPrior to all pen etra nt exam i

13、n atio n, the surface to be exam ined and all adjace nt areas withi n at least 1in. (25.4mm) shall be dry and free of dirt, grease, lint, scale, welding flux, weld spatter,paint, oil and otherextra neous matter. If n ecessary, surface shall be prepare by grinding or mach ining.4.3 Preclea ning4.3.1

14、The areas to be exam ined and adjace nt areas with in at least 1in. (25.4mm) shall be clea ned using clea ning age nt before the pen etra nt is applied.4.3.2 After cleaning, drying of the surface to be exam ined shall be accomplished by no rmal evaporatio n or with forced air, as appropriate. The mi

15、nimum drying time shall ensure that the cleaning solution has evaporated prior to applicati on of the pen etra nt.4.4 Pen etra nt Applicati on4.4.1 The pen etra nt may be applied on the surfaceTitle: PROCEDURE FOR LIQUID PENETRANT EXAMINATION表面施加滲透劑。4.4.2在整個(gè)檢驗(yàn)期間,滲透劑和被 檢表面的溫度不得低于50F(10C),不得高于 1250F(5

16、2C)。當(dāng)在上述溫度范圍內(nèi)不能滿 足時(shí),則按照ASME規(guī)范第V卷 使用of workpieces to be examined by any suitable means such as dipp ing, brush ing or spray ing.4.4.2 The temperature of the pen etra nt and the surface to be examined shall not be below 50 F(10C) nor above 125F(52C) throughout the exam in atio n period. Whe n it is no

17、t practical to con duct a liquid pen etra nt exam in ati on within above temperature ran ge, the exam in ati on procedure at the proposed lower or higher T-653, 對(duì)提議采用的溫度范圍, temperature range shall be qualified using a quench cracked alumi num block accordi ng to ASME Code Section V T-653.4.4.3 Penet

18、ration time is critical. The minimum dwell time is show n in Table 4.4.3. For suitable temperature, the area being exam ined shall rema in wetted by the pen etra nt for the dwell time.有淬火裂紋的鋁試塊進(jìn)行驗(yàn)證。4.4.3嚴(yán)格控制滲透時(shí)間,最小滯留 時(shí)間見(jiàn)表443。適當(dāng)?shù)臏囟葪l件下, 在滯留時(shí)間內(nèi),被檢區(qū)域必須用滲透 劑保持潮濕。表443推薦的最少滯留時(shí)間MaterialFormAlu minum, magnes

19、ium. steel, brass or bron ze, tita niumCasti ngs & weldsWrought material- and high temperature extrusi ons, forgings, alloysplateDwell Times (mi n)Pen etra nt Developer57107材料呂、鎂、鋼、黃銅、青銅、鈦咼溫合金4.5多余滯留時(shí)間(min)滲透劑顯象劑57107型式鑄件和焊縫軋材-擠壓件鍛件,板材4.5 Excess Pen etfa nt RemovalExcess solve nt removable pen etra

20、nt shall be removed by wiping with a cloth or absorbent paper. The remaining traces shall be removed by lightly wiping the surface with a cloth or absorbe nt paper moiste ned with solve nt. To avoid over rem oving, flush ing the surface with solve nt shall be prohibited.4.6 Developer Applicati on4.6

21、.1 The developer shall be applied as soon as possible after多余滲透劑必須用布或吸紙擦去, 剩下的痕跡必須用蘸有溶劑的布或 紙?jiān)诒砻孑p輕地擦去。為了防止清洗 過(guò)分,禁止用溶劑清洗表面。4.6施加顯像劑4.6.1多余的滲透劑被清除且工件 干燥后,必須盡快地施加顯像劑。顯 像劑施加之前,工件表面可以自然揮 發(fā)干燥,干燥時(shí)間必須在 5-20分鐘以Table 4.4.3 Recommended minimum dwell times4.6.2施加顯像劑必須采用噴涂法, 薄且均勻,涂層厚度適中。4.6.3在施加濕型顯像劑至工件表 面之前,顯像劑必

22、須充分?jǐn)嚢琛?.6.4禁用非水濕顯像劑浸漬或灌 洗工件,因非水濕顯像劑會(huì)通過(guò)溶解 作用將缺陷中的滲透劑溶解掉。4.7判斷4.7.1最終判斷顯像時(shí)間應(yīng)從施加excess pen etra nt removal and dryi ng surface. The surface may be內(nèi)。 dried by normal evaporation before the developer is applied. The drying time shall be within 5 to 20 min.4.6.2 The developer shall be applied by spray ing

23、. A uniform thin coati ng shall be provided and the coat ing thick ness shall be suitable.4.6.3 Prior to applying wet developer to the surface, the developer must be thoroughly agitated.4.6.4 Dipp ing or flood ing the part with non-aqueous developer is prohibited, since it will dissolve the penetran

24、t in the disc ontinu ities through its solve nt action.4.7 In terpretati on4.7.1 Develop ing time for final in terpretati on begiqsTitle: PROCEDURE FOR LIQUID PENETRANT EXAMINATIONas soon as a wet developer coating is dry. The minimum develop ing time shall be 7min.4.7.2 Final interpretation shall b

25、e made within 7 to 60 min after the requirements of Para. 4.7.1 are satisfied.4.7.3 The develop ing trace can be exam ined either by n atura light or artificial light. A minumum light intensity of 50 fc (500Lx) is required to ensure adequate sensitivity during the exam in atio n and evaluati on of i

26、n dicati ons.4.7.4 The surface shall be divided in to several parts to be exam ined if the surface is so large that the exam in atio n can not be finished within the given time. The developing condition can be observed either by eyes or by means of a magnifier.4.8 Post-clea ningThe penetrant materia

27、ls shall be clearly removed away from parts after exam in ati on. The post clea ning must be performed if remaining penetrant materials can result in corrosion by the comb in ati on with other materials duri ng the operatio n.The suitable cleaning process shall be adopted for post cleaning such as f

28、lushing with water, mechanical cleaning, solve nt soak ing, etc.The developer shall be cleaned as soon as possible after exam in atio n if the part requests the post clea ning so as to avoic it conden sed on the part.5. Evaluati on of In dicati ons5.1 Broad areas of pigmentation which could mask in

29、dicati ons of disc ontin uities are un acceptable and such areas shall be clea ned and reexam in ed.5.2 An indication is the evidenee of a mechanical imperfection. Only indications with major dimensions greater tha n 1/16 in (1.6mm) shall be con sidered releva nt.5.3 Lin ear in dicati ons are those

30、in dicatio ns in which the length is more than three times the width . Rounded indications are in dicati ons which are circular or ellipsoidal with the len gth less than three times the width.5.4 Any questi on able or doubtful in dicati ons shall be reexam ined to determ ine whether or not they are

31、releva nt. Surface con diti oning may proceed before the reexam in atio n.5.5 The in dicati on of a disc on ti nu ity may be larger tha n the disc on ti nu ity that causes it; however, the size of the in dicati on is the basis of accepta nee or rejecti on.6. Accepta nee Stan dardsThe follow ing rele

32、va nt in dicatio ns are un acceptable:a. any cracks or releva nt lin ear in dicati ons;b. releva nt roun ded in dicati ons greater tha n 3/16i n. (4.8mm);c. four or more releva nt roun ded in dicati ons in a li ne separated by 1/16 in. (1.6mm) or less (edge to edge);干顯像劑后或從濕顯像劑涂層干燥后 立即起算,不得少于 7分鐘。4.7.2在滿足4.7.1要求后,最終判斷 必須在7-60分鐘內(nèi)作出。4.7.3顯像痕跡可以通過(guò)自然光或人 工白光進(jìn)行檢驗(yàn),要求最小燈光強(qiáng)度 為50fc(500LX),以保證在檢驗(yàn)和評(píng)價(jià) 顯示過(guò)程中有充分的靈敏度。4.7.4如果受檢表面太大,無(wú)法在規(guī) 定時(shí)間內(nèi)完成檢驗(yàn),則應(yīng)將表面分成 幾個(gè)部進(jìn)行檢驗(yàn)。顯像情況可以用肉 眼或放大鏡進(jìn)行觀察。4.8后清洗檢驗(yàn)后,必須完全清除工件上的滲透 材料,如果殘余滲透材料在操作過(guò)程 中與其它材料混合后會(huì)導(dǎo)致腐蝕,則 必須

溫馨提示

  • 1. 本站所有資源如無(wú)特殊說(shuō)明,都需要本地電腦安裝OFFICE2007和PDF閱讀器。圖紙軟件為CAD,CAXA,PROE,UG,SolidWorks等.壓縮文件請(qǐng)下載最新的WinRAR軟件解壓。
  • 2. 本站的文檔不包含任何第三方提供的附件圖紙等,如果需要附件,請(qǐng)聯(lián)系上傳者。文件的所有權(quán)益歸上傳用戶所有。
  • 3. 本站RAR壓縮包中若帶圖紙,網(wǎng)頁(yè)內(nèi)容里面會(huì)有圖紙預(yù)覽,若沒(méi)有圖紙預(yù)覽就沒(méi)有圖紙。
  • 4. 未經(jīng)權(quán)益所有人同意不得將文件中的內(nèi)容挪作商業(yè)或盈利用途。
  • 5. 人人文庫(kù)網(wǎng)僅提供信息存儲(chǔ)空間,僅對(duì)用戶上傳內(nèi)容的表現(xiàn)方式做保護(hù)處理,對(duì)用戶上傳分享的文檔內(nèi)容本身不做任何修改或編輯,并不能對(duì)任何下載內(nèi)容負(fù)責(zé)。
  • 6. 下載文件中如有侵權(quán)或不適當(dāng)內(nèi)容,請(qǐng)與我們聯(lián)系,我們立即糾正。
  • 7. 本站不保證下載資源的準(zhǔn)確性、安全性和完整性, 同時(shí)也不承擔(dān)用戶因使用這些下載資源對(duì)自己和他人造成任何形式的傷害或損失。

評(píng)論

0/150

提交評(píng)論