2012年部門體系績(jī)效指標(biāo)達(dá)成報(bào)告 Audit Report1三段論模版

外延一部管理評(píng)審報(bào)告EPITeam1Managementauditreport本部門1-9月三標(biāo)推進(jìn)基本情況綜述SummaryofthegeneralsituationofISO9000,14001,18000advancementofourteamfromAug.toSep.1.1：組織本部門人員認(rèn)真學(xué)習(xí)了三標(biāo)標(biāo)準(zhǔn);制訂了本部門的質(zhì)量、環(huán)境及職業(yè)健康安全目標(biāo)。ArrangeourteammembersfinishingthestudyofISO9000,14001,18000.Edittargetofthequality,environment,vocationalhealthandsafetyaboutourdepartment.1.2:完成了相關(guān)的SOP18份Makethe18relativeSOPfiles.1.3:對(duì)本部門員工進(jìn)行了相關(guān)專業(yè)技能培訓(xùn)。Conductthetechnicaltrainingforourteammembers.目標(biāo)及完成情況分析TargetandanalysisoftherelativeProgress2.1質(zhì)量目標(biāo)及進(jìn)展情況QualityTargetandProgress部門TeamNo.內(nèi)容Item總目標(biāo)TotalTarget8月Aug9月Sep.外延技術(shù)一部EpiProductionTechnologyTeam11生產(chǎn)良率（MOCVD出片率*表面良率*均勻性良率*波長(zhǎng)良率*點(diǎn)測(cè)良率*ESD良率）ProductionYield(%)(OutputRatio*SurfaceYield*UniformityYield*WavelengthYield*ProbingYield*ESDYield)80%70%70%結(jié)果Result39%62%2MOCVD使用率（使用的MOCVD數(shù)/總共機(jī)臺(tái)數(shù)）MOCVDoperatingrate(OperatingMOCVDnumber/TotalMOCVDnumber)80%70%70%結(jié)果Result58%74%3投入量產(chǎn)的MOCVD機(jī)臺(tái)數(shù)MassProductionentrynumberofMOCVD19set66結(jié)果Result24工藝組ProcessGroup1改善表面（表面不良的片數(shù)/總投入片數(shù)）Improveofsurface(Surfacefailwafernumber/Totalinputwafernumber)<5%目標(biāo)/月target/month10.00%10.00%結(jié)果Result1.27%3.78%2改善均勻性（均勻性不良的片數(shù)/總投入片數(shù)）ImproveofUniformity(Uniformityfailwafernumber/Totalinputwafernumber)<5%目標(biāo)/月target/month10.00%10.00%結(jié)果Result4.5%49%3改善點(diǎn)測(cè)良率（點(diǎn)測(cè)良率在70%以下的片數(shù)/總投入片數(shù)）ImproveofProbingYield(electriccharacteristicbelow70%wafernumber/Totalinputwafernumber)<5%目標(biāo)/月target/month10.00%10.00%結(jié)果Result12.6%4.5%4ESD良率（ESD良率在80%以上的片數(shù)/總投入片數(shù)）ESDYield(2000v)(ESDYieldover80%wafernumber/Totalinputwafernumber)≥85%≥85%≥85%結(jié)果Result57.5%86.8%5出片率（出片數(shù)/總投入片數(shù)）Outputratio(Outputwafernumber/MOCVDinputwafernumber)>95%目標(biāo)/月target/month95%95%結(jié)果Result95.65%97.15%6改善波長(zhǎng)特性（波長(zhǎng)超出一定范圍的片數(shù)/總投入片數(shù)）ImproveofWavelengthoutofRangeratio(Wavelengthoutofrangewafernumber/Totalinputwafernumber)<5%目標(biāo)/月target/month10%10%結(jié)果Result13.8%19.7%設(shè)備組EquipmentGroup7MOCVD運(yùn)行狀況MOCVDoperatingstatusMOCVD運(yùn)行效率（MOCVD運(yùn)行時(shí)間/計(jì)劃量產(chǎn)時(shí)間）MOCVDrunningefficiency(MOCVDrunningtime/productionplantime)>95%95%95%結(jié)果Result88.9%88.2%8MOCVD事故次數(shù)MOCVDaccidenttime2次/月（1臺(tái)）*量產(chǎn)機(jī)臺(tái)數(shù)2times1212/month（1set）*ProductionMOCVDnumber結(jié)果Result26外延一部正處于初步量產(chǎn)階段,部份質(zhì)量結(jié)果尚未達(dá)到目標(biāo)值，工藝參數(shù)需要進(jìn)一步優(yōu)化和改善。目前，所有工程師正在為盡快實(shí)現(xiàn)目標(biāo)而努力著。Inthestageoftheprimaryproduction,partoftheQualityTargethasnotbeenaccomplishedandprocessneedtobeimprovedandoptimized.Nowalltheengineersarestrivingfortarget.資源需求和改進(jìn)意見Resourcerequirementanditsimprovementsuggestion需要及時(shí)得到產(chǎn)品的最終測(cè)試數(shù)據(jù)