標(biāo)準(zhǔn)解讀
《GB/T 44515-2024 微機(jī)電系統(tǒng)(MEMS)技術(shù) MEMS壓電薄膜機(jī)電轉(zhuǎn)換特性測量方法》是一項(xiàng)國家標(biāo)準(zhǔn),旨在為MEMS壓電薄膜器件的機(jī)電轉(zhuǎn)換性能提供統(tǒng)一、規(guī)范的測試方法。該標(biāo)準(zhǔn)適用于各類基于壓電效應(yīng)工作的微機(jī)電系統(tǒng)中的薄膜材料,如傳感器、執(zhí)行器等,其核心在于定義了一系列關(guān)于如何準(zhǔn)確評估這些材料或結(jié)構(gòu)在特定條件下將機(jī)械能轉(zhuǎn)化為電能(反之亦然)效率的具體步驟和技術(shù)要求。
根據(jù)文檔內(nèi)容,它首先明確了適用范圍和術(shù)語定義,確保行業(yè)內(nèi)對關(guān)鍵概念有一致理解。接著,詳細(xì)描述了實(shí)驗(yàn)所需設(shè)備及其精度要求,包括但不限于信號發(fā)生器、示波器、力傳感器等,并規(guī)定了環(huán)境條件控制的重要性,比如溫度、濕度等因素可能對測試結(jié)果產(chǎn)生的影響。此外,還特別強(qiáng)調(diào)了樣品準(zhǔn)備過程中的注意事項(xiàng),以保證測試數(shù)據(jù)的有效性和可重復(fù)性。
對于實(shí)際測量流程,《GB/T 44515-2024》提供了詳細(xì)的指導(dǎo)原則,涵蓋從初始設(shè)置到最終數(shù)據(jù)分析的全過程。這包括如何施加激勵信號、記錄響應(yīng)信號以及計算相關(guān)參數(shù)的方法。同時,也指出了可能出現(xiàn)的數(shù)據(jù)異常情況及處理建議,幫助研究人員更好地理解和分析實(shí)驗(yàn)結(jié)果。
如需獲取更多詳盡信息,請直接參考下方經(jīng)官方授權(quán)發(fā)布的權(quán)威標(biāo)準(zhǔn)文檔。
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GB/T 44515-2024微機(jī)電系統(tǒng)(MEMS)技術(shù)MEMS壓電薄膜機(jī)電轉(zhuǎn)換特性測量方法-免費(fèi)下載試讀頁文檔簡介
ICS31.080.99
CCSL59
中華人民共和國國家標(biāo)準(zhǔn)
GB/T44515—2024/IEC62047?30:2017
微機(jī)電系統(tǒng)(MEMS)技術(shù)
MEMS壓電薄膜機(jī)電轉(zhuǎn)換特性測量方法
Micro?electromechanicalsystem(MEMS)technology—Measurementmethodsof
electro?mechanicalconversioncharacteristicsofMEMSpiezoelectricthinfilm
(IEC62047?30:2017,Semiconductor—Micro-electromechanicaldevices—
Part30:Measurementmethodsofelectro?mechanicalconversion
characteristicsofMEMSpiezoelectricthinfilm,IDT)
2024?09?29發(fā)布2025?01?01實(shí)施
國家市場監(jiān)督管理總局
國家標(biāo)準(zhǔn)化管理委員會發(fā)布
GB/T44515—2024/IEC62047?30:2017
目次
前言··························································································································Ⅲ
1范圍·······················································································································1
2規(guī)范性引用文件········································································································1
3術(shù)語和定義··············································································································1
4MEMS壓電薄膜試驗(yàn)臺······························································································1
4.1總則·················································································································1
4.2功能模塊和組件··································································································3
5被測薄膜·················································································································4
5.1通則·················································································································4
5.2測量原理···········································································································4
5.3正橫向壓電系數(shù)的測量流程···················································································4
5.4逆橫向壓電系數(shù)的測量流程···················································································4
6測試報告·················································································································5
附錄A(資料性)MEMS壓電薄膜測量方法的示例·····························································7
A.1概述·················································································································7
A.2樣品制備流程·····································································································7
A.3測量流程···········································································································7
A.4測試報告·········································································································10
A.5中性面的方程···································································································12
參考文獻(xiàn)····················································································································13
Ⅰ
GB/T44515—2024/IEC62047?30:2017
前言
本文件按照GB/T1.1—2020《標(biāo)準(zhǔn)化工作導(dǎo)則第1部分:標(biāo)準(zhǔn)化文件的結(jié)構(gòu)和起草規(guī)則》的規(guī)
定起草。
本文件等同采用IEC62047?30:2017《半導(dǎo)體器件微機(jī)電器件第30部分:MEMS壓電薄膜機(jī)
電轉(zhuǎn)換特性測量方法》。
本文件做了下列最小限度的編輯性改動。
——為與現(xiàn)有標(biāo)準(zhǔn)協(xié)調(diào),將標(biāo)準(zhǔn)名稱改為《微機(jī)電系統(tǒng)(MEMS)技術(shù)MEMS壓電薄膜機(jī)電轉(zhuǎn)換
特性測量方法》。
——增加了3.2和3.3的注釋。
——對圖1進(jìn)行了進(jìn)一步標(biāo)注,使得表1的描述與圖1相對應(yīng)。依據(jù)中文行文中圖與表述位置接
近的原則,將圖1的解釋說明“MEMS壓電薄膜橫向壓電系數(shù)試驗(yàn)臺的功能模塊或組件的基
本構(gòu)成見圖1”調(diào)整至圖1出現(xiàn)的位置前后,即4.1處。
6a)11c(min)c()c(max)c()
——更正了第章)中“e31,f”,改為“e31,fVin,min”,更正“e31,f”為“e31,fVin,max”。
6b)3ed31fdec31fminc()ec31
——更正了第章)中“,”,改為“e31,f”,更正“,()”為“e31,fVin,min”,更正“,
fmaxc()
()”為“e31,fVin,max”。
6b)4ec31f0c()
——更正了第章)中“,()”,改為“e31,fVin,0”。
A.3.2c()c()10.0N/Vm15.0N/Vm
——更正了中“e31,fVin,0和e31,fVin,max可分別確定為和”,改為
|c()|c()|10.6N/Vm15.0N/Vm
“e31,fVin,0和|e31,fVin,max可分別確定為和”。
A.3d
——更正了表正橫向壓電系數(shù)計算結(jié)果“e31,f”,改為負(fù)值。
A.611c(min)c()c(max)c()
——更正了表第項(xiàng)中“e31,f”,改為“e31,fVin,min”,更正“e31,f”為“e31,fVin,max”。
請注意本文件的某些內(nèi)容可能涉及專利。本文件的發(fā)布機(jī)構(gòu)不承擔(dān)識別專利的責(zé)任。
本文件由全國微機(jī)電技術(shù)標(biāo)準(zhǔn)化技術(shù)委員會(SAC/TC336)提出并歸口。
本文件起草單位:北京自動化控制設(shè)備研究所、安徽奧飛聲學(xué)科技有限公司、芯聯(lián)集成電路制造股
份有限公司、中機(jī)生產(chǎn)力促進(jìn)中心有限公司、蘇州大學(xué)、無錫華潤上華科技有限公司、太原航空儀表有
限公司、中國航天科工飛航技術(shù)研究院、山東中康國創(chuàng)先進(jìn)印染技術(shù)研究院有限公司、深圳市美思先
端電子有限公司、北京遙測技術(shù)研究所、西安交通大學(xué)、北京晨晶電子有限公司、上海新微技術(shù)研發(fā)中
心有限公司、天津新智感知科技有限公司、上海芯物科技有限公司、天津大學(xué)、北京大學(xué)、河北初光汽車
部件有限公司、共達(dá)電聲股份有限公司、河南芯睿電子科技有限公司、廣東潤宇傳感器股份有限公司、
華景傳感科技(無錫)有限公司。
本文件主要起草人:王永勝、張紅宇、安志武、李根梓、張菁華、孫立寧、蘇翼、張新偉、李拉兔、
劉會聰、邢文忠、徐堃、毛志平、路文一、單偉中、許克宇、王志廣、湯一、要彥清、婁亮、鄭冬琛、陳得民、
姚鵬、胡曉東、盧弈鵬、袁長作、仲勝利、侯杰、陳福操、李樹成、王志宏。
Ⅲ
GB/T44515—2024/IEC62047?30:2017
微機(jī)電系統(tǒng)(MEMS)技術(shù)
MEMS壓電薄膜機(jī)電轉(zhuǎn)換特性測量方法
1范圍
本文件描述了用于壓電式微傳感器和微執(zhí)行器等器件的壓電薄膜機(jī)電轉(zhuǎn)換特性測量方法。
本文件適用于
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