化學(xué)檢測(cè)相關(guān)中英文對(duì)照

1、TEM: Subject index10 / 10文檔可自由編輯打印Aberration像差chromatic色差spherical球差astigmatic像散Absorption coefficient吸收系數(shù)abnormal反常吸收系數(shù)uniform均勻吸收系數(shù)Aperture光闌objective aperture物鏡光闌selective area aperture選區(qū)光闌condenser lens aperture聚光鏡光闌size光闌尺寸Astigmatism像散Anomalous absorption coefficient反常吸收系數(shù)Alignment of electron

2、 microscope電子顯微鏡的對(duì)準(zhǔn)Antiphase domains反相疇Antiphase domain boundaries反相疇界Artefacts in specimens樣品中的人為缺陷Atomic scattering amplitude原子散射振幅Back focal plane后焦面Beam current density束流密度Beam direction電子束方向Bend contours彎曲條紋Bend center彎曲中心Bend extinction contours彎曲消光條紋Bright field明場(chǎng)Bright field image明場(chǎng)像Burgers

3、vector determinations柏氏矢量確定Calibration of electron microscope電子顯微鏡的校準(zhǔn)Camera constant相機(jī)常數(shù)Camera length相機(jī)長度Cavities空洞Characteristic images from a perfect crystal完整晶體特征圖像thickness fringes厚度消光條紋bend extinction contours彎曲消光條紋bend contours彎曲條紋bend center彎曲中心Chemical polishing for specimen preparation試樣的化學(xué)

4、拋光Chromatic abberation色差Coherency of precipitates沉淀相的共格性Coherency strain contrast共格應(yīng)變襯度Column approximation晶柱近似Condenser lens聚光鏡Constrained strain約束應(yīng)變Dark field暗場(chǎng)Dark-field images暗場(chǎng)像Defocus欠焦Deformation of specimen試樣變形Depth of field景深Depth of focus焦深Deviation parameter偏移參量effective value of有效偏移參量Dif

5、fraction contrast 衍射襯度Diffraction function衍射函數(shù)Diffraction mode衍射模式Diffraction pattern 衍射花樣Diffraction theory衍射理論Direct lattice images直接點(diǎn)陣像Dislocations位錯(cuò)contrast from 位錯(cuò)襯度density of位錯(cuò)密度determination of Burgers vector of位錯(cuò)柏氏矢量的確定displacement fields around圍繞位錯(cuò)的位移場(chǎng)nodes位錯(cuò)結(jié)perfect (whole)完全位錯(cuò)partial不全位錯(cuò)D

6、isplacement fringe contrast from precipitates 沉淀相粒子的位移條紋襯度Domain boundaries疇界Double condenser lens雙聚焦透鏡Double diffraction雙衍射Dynamical theory of electron diffraction電子衍射的動(dòng)力學(xué)理論Edwald sphere厄瓦爾德球Effective value有效(值)deviation parameter有效偏移參量extinction distance有效消光距離Electron beam電子束transmitted透射(電子)束diff

7、racted衍射(電子)束Electron diffraction電子衍射Electron diffraction patterns電子衍射花樣accuracy of電子衍射花樣的精度calibration of電子衍射花樣的校準(zhǔn)effects of crystal shape電子衍射花樣的形狀效應(yīng)indexing of電子衍射花樣的標(biāo)定Kikuchi lines菊池線花樣polycrystalline ring多晶環(huán)狀衍射花樣single crystal spot單晶斑點(diǎn)衍射衍射streaks on電子衍射花樣的芒線Electron gun電子槍Electron microscope電子顯微

8、鏡analytical分析電鏡attachments for電子顯微鏡的附件high resolution高分辯電鏡magnification of電子顯微鏡的放大倍數(shù)ray diagrams for電子顯微鏡的光路圖resolving power of電子顯微鏡的分辯力transmission 透射電鏡Electron microscopy電子顯微學(xué)(術(shù))analytical分析電子顯微學(xué)(術(shù))conventional常規(guī)電子顯微學(xué)high resolution高分辯電子顯微學(xué)(術(shù))transmission透射電子顯微學(xué)Electron wavelengths電子波長Electropolis

9、hing for specimen preparation電解拋光制備電鏡試樣Extinction消光Extinction contours 消光條紋Extinction distance消光距離Extrinsic插入型的Faults 缺陷Focus distance焦距Foil thickness薄膜厚度measurement of膜厚測(cè)量Fringes條紋displacement位移條紋magnetic domain wall 磁疇壁條紋moire Moirre條紋precipitates, from由沉淀相粒子引起的 條紋stacking fault層錯(cuò)條紋thickness厚度條紋Go

10、niometer stage測(cè)角臺(tái)Heating stages加熱臺(tái)High order Laue Zone高階勞厄區(qū)High resolution electron microscopy 高分辯電鏡Identification of precipitates沉淀相鑒別Illumination of specimen試樣照明contamination by試樣照明引起的污染damage by試樣照明引起的破壞Image圖像bright field明場(chǎng)像dark field暗場(chǎng)像intermediate中間像rotation of像轉(zhuǎn)Image contrast圖像襯度origin of圖像襯度

11、的來源antiphase domains, from反相疇圖像襯度antiphase domain boundaries, from反相疇界圖像襯度cavities, from空洞圖像襯度dislocations, from, 位錯(cuò)的襯度dipoles位錯(cuò)偶極子的襯度double images位錯(cuò)雙線襯度edges刃型位錯(cuò)襯度general dislocation一般位錯(cuò)的襯度inclined傾斜位錯(cuò)的襯度invisibility criteria for位錯(cuò)不可見位錯(cuò)loops位錯(cuò)圈的襯度oscillation effects at位錯(cuò)襯度的振蕩效應(yīng)partial 不全位錯(cuò)的襯度screws

12、螺型位錯(cuò)的襯度superdislocations超位錯(cuò)的襯度surface relaxation effects位錯(cuò)襯度的表面松弛效應(yīng)visibility rules for位錯(cuò)不可見規(guī)律width of images位錯(cuò)圖像寬度partial dislocations不全位錯(cuò)的襯度FrankFrank位錯(cuò)的襯度SchockleySchockley位錯(cuò)的襯度precipitates,from, 沉淀相粒子的襯度coherency strain field images沉淀相粒子的共格應(yīng)變場(chǎng)襯度dislocation ring contrast沉淀相粒子的位錯(cuò)圈襯度displacement fr

13、inge contrast沉淀相粒子的位移條紋襯度matrix contrast沉淀相粒子的基體襯度moire fringes沉淀相粒子的Morrie條紋襯度orientation contrast沉淀相粒子的取向襯度structure factor contrast沉淀相粒子的結(jié)構(gòu)因子襯度visibility of沉淀相粒子的可見性stacking faults, from, 層錯(cuò)引起的襯度determination of nature of 層錯(cuò)性質(zhì)的確定twin boundaries, from孿晶界的襯度Image force鏡像力Image formation圖像形成(成像)Abby

14、s theory ofAbby成像理論Image function像函數(shù)Image mode圖像模式Image plane像平面Image rotation像轉(zhuǎn)Inclusions 夾雜Indexing of electron patterns電子衍射花樣標(biāo)定trier and error嘗試校核法known camera constant已知相機(jī)長度standard diffraction patterns標(biāo)準(zhǔn)衍射譜法computer simulation計(jì)算機(jī)標(biāo)定法ambiguous 不唯一性Inelastic scattering非彈性散射Interface contrast界面襯度In

15、termediate image中間像Intermediate image plane中間像平面Intrinsic抽出型的Ion bombardment technique for specimen preparation離子束轟擊制樣法Kikuchi pattern菊池線花樣Kikuchi lines菊池線Kikuchi maps菊池線圖Kinematical theory of diffraction contrast運(yùn)動(dòng)學(xué)衍襯理論Lattice image 點(diǎn)陣像two beam雙束點(diǎn)陣(平面)像many beam 多束點(diǎn)陣像structure image結(jié)構(gòu)像Lattice plane

16、 spacing點(diǎn)陣面間距Laue circle勞厄園Laue zones勞厄區(qū)high order高階勞厄區(qū)Line defect線缺陷Line of no contrast無襯度線Magnetic lens電磁透鏡aberrations of電磁透鏡的像差focal length of電磁透鏡的焦距pole-piece of電磁透鏡的極靴Many-beam effects多束效應(yīng)Measurements of; dislocation density, 位錯(cuò)密度測(cè)量elastic strain fields of precipitates沉淀相粒子彈性應(yīng)變場(chǎng)測(cè)量foil thickness

17、膜厚測(cè)量precipitate size,沉淀相粒子尺寸測(cè)量stacking fault energy層錯(cuò)能測(cè)量nodes, by用位錯(cuò)結(jié)測(cè)量層錯(cuò)能 ribbon widths, by用層錯(cuò)帶寬度測(cè)量層錯(cuò)能Microanalysis微區(qū)分析Moire patternsMoire花樣from precipitates沉淀相粒子Moire花樣mixed混合Moire條紋parallel平行Moire條紋rotation旋轉(zhuǎn)Moire條紋spacing ofMoire條紋間距Nodes, extended threefold, 三維擴(kuò)展位錯(cuò)結(jié)stacking fault energy from三維擴(kuò)

18、展位錯(cuò)結(jié)測(cè)量層錯(cuò)能Objective wave function物波函數(shù)Objective lens物鏡Operating vector操作矢量Operation reflection操作反射Orientation determination取向確定Orientation relationship取向關(guān)系Parallel moire patterns平行Moire條紋Partial dislocations, contrast from 平行位錯(cuò)的襯度determination of Burgers vectors of位錯(cuò)柏氏矢量的確定FrankFrank位錯(cuò)柏氏矢量確定ShockleySh

19、ockley位錯(cuò)柏氏矢量確定Particles粒子Planar defect面缺陷Point defects in specimen試樣中的點(diǎn)缺陷Pole-piece of magnetic lens電磁透鏡極靴Precipitates沉淀相粒子contrast from沉淀相粒子襯度size of沉淀相粒子尺寸visibility of沉淀相粒子可見性Precipitation contrast沉淀相襯度Projective lens投影鏡Reciprocal lattice倒易點(diǎn)陣construction倒易點(diǎn)陣的構(gòu)筑definition of倒易點(diǎn)陣的定義properties of倒易點(diǎn)

20、陣的性質(zhì)Replica復(fù)型Resolution分辯率Ring diffraction patterns環(huán)狀衍射花樣Rotation moirre patterns旋轉(zhuǎn)Moirre花樣Satellites on electron diffraction patterns衍射花樣衛(wèi)星斑點(diǎn)Scattering amplitude 散射振幅Scattering of electrons電子散射Second phase particles第二相粒子Selected area diffraction選區(qū)電子衍射accuracy of選區(qū)電子衍射的精度Shape effect形狀效應(yīng)Single cryst

21、al diffraction patterns單晶電子衍射花樣Specimen試樣contamination of試樣污染cooling of試樣冷卻deformation of試樣變形heating of試樣加熱microanalysis of試樣微區(qū)分析orientation of試樣的取向preparation of試樣制備chemical machining試樣加工chemical polishing, by用化學(xué)拋光制備試樣ion bombardment, by離子轟擊制備試樣electropolishing電解拋光制備試樣jet machining, by, 電解雙噴制樣法Spec

22、imen holder試樣臺(tái)top enrty頂插式試樣臺(tái)side entry側(cè)插式試樣臺(tái)Spherical aberration 球差Spinodal decomposition拐點(diǎn)分解Stacking faults層錯(cuò)contrast of 層錯(cuò)的襯度determination of nature of確定層錯(cuò)的性質(zhì)energy of層錯(cuò)能types of層錯(cuò)類型Sterogram極圖Stereomicroseopy體視顯微術(shù)Stigmator消像散器Strainfields 應(yīng)變場(chǎng)Streaks on electron diffraction patterns衍射花樣的星芒線Struct

23、ure factor結(jié)構(gòu)因子contrast from, 結(jié)構(gòu)因子襯度Subsidiary fringe副條紋Superlattice超點(diǎn)陣reflections超點(diǎn)陣反射Theory of diffraction contrast衍射襯度理論kinematic運(yùn)動(dòng)學(xué)衍襯理論dynamic動(dòng)力學(xué)衍襯理論Two beam approximation雙束近似Uniform absorption coefficient反常吸收系數(shù)Viewing screen熒光屏Weak beam technique弱束技術(shù)Weak beam dark field image弱束暗場(chǎng)象Zone晶帶Zone law晶

24、帶定理Zone axis晶帶軸Zone axis patterns晶帶軸花樣HREMAiry discAiry園(盤)Amplitude object振幅物Amplitude contrast振幅襯度Astigmatism像散Astigmator消像散器Axial軸向照明Axial alignment合軸調(diào)整Chromatic aberration coefficient色差系數(shù)Chromatic aberration色差Chromatic aberration limited resolution色差限制的分辯率Cluster偏聚區(qū)Coherence相干性Defocus欠焦Diffracti

25、on contrast衍射襯度Diffraction limit衍射極限D(zhuǎn)iffraction limited resolution衍射限制的分辯率Diffused circle彌散園Exact focus準(zhǔn)確聚焦Experimental condition實(shí)驗(yàn)條件Exsolution脫溶Focus聚焦, 焦距, 焦點(diǎn)Focal length焦距Frensnel fringes菲捏爾條紋Grain boundaries晶界small angle小角度晶界high angle大角度晶界symmetrical對(duì)稱晶界asymmetrical不對(duì)稱晶界tilt傾斜晶界Guinier-Preston

26、zonesGP區(qū)HREM images高分辯電鏡圖像interpretation高分辯電鏡圖像的解釋information available高分辯電鏡圖像的信息image analysis of圖像分析computer simulation of計(jì)算機(jī)模擬Illumination照明axial軸向照明tilted傾斜照明Illumination semi-angle照明半角Image analysis圖像分析Imaging mode圖像模式lattice plane點(diǎn)陣平面像many beam多束點(diǎn)陣像structure結(jié)構(gòu)像Image restoration圖像修復(fù)Incident wav

27、e入射波Interaction constant交互作用常數(shù)Interplanar spacing面間距Internal standards內(nèi)標(biāo)Line to line resolution線分辯率Multi-slice approximation多片近似Optical diffraction光學(xué)衍射Optimum defocus最佳欠焦(量)Optimum resolution最佳分辯率Optimum illumination semi-angle 最佳照明半角Optimum aperture size最佳光闌尺寸Order/disorder transition有序/無序轉(zhuǎn)變Orienta

28、tion取向BraggBragg取向LaueLaue取向Over focus過焦Phase change相位變化induced by defocus欠焦引起的相位變化by spherical aberration球差引起的相位變化Phase contrast相位襯度Phase contrast transfer function相位襯度傳遞函數(shù)Phase grating相位光柵Phase grating approximation相位光柵近似Phase object相位物Phase object approximation相位物近似Phase shift相位變化Phase transition

29、相轉(zhuǎn)變Phase transformation相變Point source點(diǎn)源Point to point點(diǎn)分辯率Projected potential投影勢(shì)Propagation function傳遞函數(shù)Polymorphism多型性(轉(zhuǎn)變)Resolution分辯率line to line線分辯率point to point點(diǎn)分辯率Resolution limit分辯率極限Scattered wave散射波Spherical aberration球差Spherical aberration coefficient球差系數(shù)(CS)Spherical aberration limited re

30、solution球差限制的分辯率Tilted illumination傾斜照明Through focus series聚焦系列Two beam lattice plane imaging雙束點(diǎn)陣平面像Two beam lattice fringe imaging雙束點(diǎn)陣條紋像Weak phase approximation弱相位近似AEMAamorphous carbon 非晶碳EELS absolute quantification用于EELS絕對(duì)定量analytical electron microscope 分析電鏡alignment對(duì)中calibration for EELS or E

31、DSEELS或EDS定標(biāo)analytical electron microscopy分析電子顯微學(xué)annular dark-field imaging 環(huán)狀暗場(chǎng)像annular detector環(huán)狀探頭apertures 光闌2nd condenser lens (C2) 第二聚光鏡光闌effect on microanalysis對(duì)微區(qū)分析的影響effect on microdiffraction對(duì)微束衍射的影響effect on probe convergence對(duì)探針會(huì)聚性的影響objective物鏡光闌selected area (SA) 選區(qū)光闌ultra-thick超厚光闌Auge

32、r electrons俄歇electron spectroscopy俄歇譜Bbackground spectrum本底(背底)譜in EELSEELS背底譜subtraction in EDS扣除EDS譜背底subtraction in EELS扣除EDS譜背底X-rays扣除X-射線背底(請(qǐng)參見 bremsstrahlung 和 continuum)backscattered electrons背散射電子detector背散射電子探頭images背散射電子像beam電子束beam damage電子束損傷beam-sensitive specimens電子束敏感試樣beam-specimen

33、interactions電子束-試樣交互作用beam spreading電子束擴(kuò)展beryllium window鈹窗bremsstrahlung X-rays背底輻射X-射線bright field detector明場(chǎng)探頭bright field image in STEMSTEM 明場(chǎng)像brightness of electron source電子源亮度Ccalibration校準(zhǔn), 定標(biāo)cathode ray tube陰極射線管cathodoluminescence陰極熒光(輻射)Cliff-Lorimer equationCliff-Lorimer 公式condenser lens

34、first (C1) 第一聚光鏡condenser lens second (C2) 第二聚光鏡condenser objective lens聚光鏡物鏡contamination污染use to determine thickness用于厚度測(cè)定continuum X-rays連續(xù)(背底)X-射線convergent beam diffraction 會(huì)聚束衍射use to determine thickness用于厚度測(cè)定convergent beam diffraction patterns (CBDP)會(huì)聚束衍射花樣convergent electron probe會(huì)聚電子探針crys

35、tal point group (晶體)點(diǎn)群Ddark field detector 暗場(chǎng)探頭dark field image in STEMSTEM暗場(chǎng)像deconvolution解譜, EDS或EELSof EDS spectrum, of EELS spectrumdiad symmetry二次對(duì)稱diffraction groups 衍射群diffraction maxima衍射極大值EEDS (Energy Dispersive Spectroscopy) 能譜(能量色散譜)EDS defector 能譜探頭EELS spectrometer電子能量損失譜儀EELS 電子能量損失譜(

36、electron energy loss spectrum)zero loss peak零損失峰plasmon peak 等離子振蕩峰e(cuò)nergy loss peaks能量損失峰ionization edge電離損失峰(邊)background subtraction背底扣除elastic scatter彈性散射electron detectors電子探頭collection angle收集角electron energy loss spectrometer電子能量損失譜儀electron energy loss spectrometry電子能量損失譜energy loss processes

37、電子能量損失過程imaging/mapping電子能量損失成象ionization losses電離損失limitations極限plasmon losses等離子振蕩損失spatial resolution空間分辨率electron-hole pairs電子-空位對(duì)electron probe電子探針brightness亮度convergence angle會(huì)聚角current電流diameter直徑energy dispersive spectrometer能譜儀 (See X-ray energy dispersive58 spectrometer)energy filtered ima

38、ges能量過濾圖像extended absorption fine structure廣延吸收精細(xì)結(jié)構(gòu)extraction replica萃取復(fù)型Ffirst order laue zone (FOLZ)一階勞厄區(qū)fine structure in ionization edge電離峰(邊)精細(xì)結(jié)構(gòu)post-edge (EXAFS)峰后(EXAFS)pre-edge峰前forbidden reflections禁止反射full width half maximum半高寬Gg vectorg矢量Gaussian高斯Hhard X-rays硬X-射線higher order laue zone (

39、HOLZ)高階勞厄區(qū)indexing標(biāo)定lines高階勞厄區(qū)線reflections高階勞厄區(qū)反射rings高階勞厄區(qū)環(huán)HOLZ lines高階勞厄區(qū)線Iillumination system照明系統(tǒng)imaging in STEMSTEM成像image enhancement圖像增強(qiáng)Indexing標(biāo)定HOLZ lines高階勞厄區(qū)線HOLZ patterns高階勞厄區(qū)花樣ZOLZ patterns零階勞厄區(qū)花樣inelastic scatter非彈性散射(See also electron energy loss)effect on EDS對(duì)EDS的影響effect on EELS對(duì)EELS

40、的影響ionization電離ionization edges電離損失峰(邊)post-edge fine structure峰后精細(xì)結(jié)構(gòu)pre-edge fine structure峰前精細(xì)結(jié)構(gòu)KKossel patterns (conditions)Kossel花樣Kossel-Möllenstedt fringes use to determine thicknessK-M條紋9用于確定試樣厚度)Kossel-Möllenstedt (K-M) patternsK-M花樣Llanthanum hexaboride gun六硼化鑭電子 槍lattice paramete

41、r determination點(diǎn)陣常數(shù)確定lattice strain點(diǎn)陣應(yīng)變effect on HOLZ lines 對(duì)高階勞厄區(qū)線的影響lenses透鏡auxiliary輔助透鏡condenser聚光鏡condenser-objective聚光鏡-物鏡intermediate中間鏡objective物鏡projector投影鏡light element analysis by EDSEDS輕元素分析by EELSEELS輕元素分析limitations to X-ray analysisX-射線分析極限low loss electrons低能量損失電子Mmicrodiffraction微束

42、衍射microprobe mode微區(qū)探針模式minimum detectable mass最小可探測(cè)質(zhì)量minimum mass fraction最小質(zhì)量分?jǐn)?shù)N0objective aperture物鏡光闌objective lens物鏡Ppeak to background ratio峰/背比in EDS spectrumEDS譜in EELS spectrum EELS譜(See also signal to noise ratio)參見信/噪比phonon energy loss 聲子能量損失plasmon energy losses等離子振蕩能量損失probe convergence

43、 angle探針會(huì)聚角Qqualitative analysis定性分析using EDSEDS定性分析using EELSEELS定性分析quantitative analysis定量分析using EDSEDS定量分析using EELSEELS定量分析Rradial distribution function徑向分布函數(shù)radiation damage輻射損傷resolution分辨率of EDS spectrometer EDS譜儀分辨率ot EELS spectrometer EELS譜儀分辨率of STEM imageSTEM圖像分辨率Riecke microdiffractionRiecke法微束衍射Sscanning electron microscope 掃