半導體行業(yè)對外測試設備介紹

electrical日E用財修J.%r；岬快叫EE胸r戒網(wǎng)哪MWW/'trSSM2000electrical日E用財修J.%r；岬快叫EE胸r戒網(wǎng)哪MWW/'trThespreadingresistancetechniqueisamethodformeasuringthepropertiesofsemiconductormaterialswithveryhighspatialresolution;itisbasedonmeasurementsofthecontactresistanceofspeciallypreparedpointcontactsondopedsiliconsamples.TheSSM2000NANOSRP?Systemisanautomatedspreadingresistanceprobedesignedtocharacterizetheelectricalpropertiesofdopedsiliconmaterials.Thissystemgeneratesprofilesofresistivity,carrierdensity,andelectricallyactivedopantdensitymorequicklyandmoreeasilythanitspredecessor,theSSM150.ItisthemostadvancedSRPtestmachineinworld.Silancharacteristic1、Canaffordthebestaccuracyresultforcustom.2、WehavetheuniqueabilitytotesttheUltrashallowlayer.Examplewecantestimplantresistivityprofileronsurface.Wecanguarantee6nmresolutionfortestUltrashallowlayer.3、Canmeasuretheresistivityofpatternedsamples(dimensionofpatternabove80um).擴展電阻率測試是用高分辨率測試半導體材料的電特性。它基于被測樣片上接觸的探針來測試。SSM2000是一臺自動的用擴展電阻的方法來反應參雜硅材料電特性的機器。它能產(chǎn)生整個硅片電阻率的輪廓特性，載流子濃度，參雜濃度。它比國內(nèi)常用的SSM150要快速，準確許多。是目前世界最先進的SRP測試設備之一。士蘭特點：1、能給用戶提供國內(nèi)最精確的■測試結果?！?、是國內(nèi)唯一有能力準確測試淺層結構，如注入表層電阻率的變化特性。能保證6nm的分辨率準確性。3、能測試圖形中樣品的擴展電阻率（圖形尺寸80um以上）。SSM495C-V測試TheSSM495isanautomatic

mercuryprobecapacitance-voltage(CV)measuringsystem.TheSSM495hasanadvancedmeasurementtoolwithmanycharacteristicssuchasgoodspatialresolution,goodsensitivityandnon-destructive.TheresistivityofallkindsepisamplescanbeaccuratelymeasuredusingSSM495.Themeasurementrangeisfrom0.1tolOOQ.cminn-typewafer;from0.24to330Q.cminP-typewafers.TheSSM495canalsobeusedtomonitoroxidequality(Thresholdvoltage:Vth;Flatbandvoltage:Vfb;Oxidecapacitance:Cox;Effectiveoxidecharge:Neff).Inaddition,itcanoffergoodresolutioninmonitoringtheimplantdoseofB,PorAsinthechannelregionunderthegate.SILANCharacteristicWecantestmostofPtypeEPIwaferwhichisveryhardformanycompaniessometimes.SSM495全自動汞探針CV測試系統(tǒng)是先進的測試工具，具有空間分辨率高、靈敏度好、非破壞性等特點。它能精確地測試各種外延片的電阻率。N型硅片的測試范圍為：0.1?100Q.cm；P型硅片的測試范圍為：0.24?330Q.cm。SSM495亦可用于監(jiān)測氧化層質量(閥值電壓Vth；平帶電壓Vfb；氧化層電容Cox;氧化層電荷數(shù)Neff)。此外，對于柵極下面溝道區(qū)的B、P、入、注入劑量，SSM495能提供完美的監(jiān)測方案。士蘭特點：對于P型外延片電阻率的測試一般公司很難有能力測試，有的甚至放棄測試P型外延片，而我們能測試大部分的P型片。QSFTIR系列介紹QSFTIRseriesisanadvancedFT-IRtooldevelopedbyBio-Radlaboratories,Inc.IthasstrongfunctionswhicharewidelyusedinanalysisofPSGfilms,BPSGfilms,siliconnitridefilms,epilayersandbarewafers.TheconcentrationofBandPinBPSGfilmscanbemeasuredusingPCRorPLStechniquescontainedinQSM-408,anditcananalyzeHydrogeninsiliconnitridefilms,oxygenandcarboninsilicon,alsomeasureEpitaxialthickness.SILANCharacteristic1、WeowntheBio-RadQSseriesFTIRmachineswhichisthefamousFTIRinworld.IncludingseveralQS300,QS408,QS500etc.models.

2、Wecanaffordtherapidandaccuracyresultbyourexperienceandtheory.QSFTIR系列是臺由Bio-Rad實驗室有限公司制造的FT-IR測試工具。其功能強大，廣泛應用于分析PSG薄膜、BPSG薄膜、Si3N4薄膜、外延層和硅片。QSFTIR提供的PCR和PLS技術可用于測試BPSG薄膜中的B、P含量。此外，QSFTIR還可用于測試Si3N4薄膜中的氫含量，硅中的碳、氧含量以及外延層的厚度。士蘭特點：1、擁有FTIR業(yè)界標準的BIO-RADQS系列產(chǎn)品，包括多臺QS300，QS408，QS500等各類型號。2、豐富的理論與實踐能力保證了測試的快速，準確性。是國內(nèi)用FTIR應用最廣泛的公司之一。Opti-Probe介紹TheOpti-Probeisapowerfulfilmthicknessmeasurementtoolthatcanmeasuremostfilmsandfilmstackswithhighprecisionandrepeatability,suchast,n,andk.Itperformsthisfunctionbyintegratingthreefilmthicknessmeasurementtechniques:BeamProfileReflectometry,VisibleSpectrometry,BeamProfileEllipsometry.Onfullyequippedsystems,theOpti-Probecanutilizeallthreetechnologiestoobtainrobust,repeatablemeasurementresults.Athinstandardshouldmeasurewithin±1Aofawafer’sknownvalue.Athickstandardshouldmeasurewithin±2Aofawafer’sknownvalue.SILANCharacteristic:Thetestingapplicationengineerwithperfectexperiencecanprovideallkindsofcomplextestproject.Theadvancedequipmentperformanceandtop-rankingtechnologyteaminChinafarthestassuretheresultsaccurate.OPTI-PROBE設備能夠測試各種

膜質和膜層的膜厚，折射率，消光系數(shù)，具有很高的精確性和重復性oOPTI-BPROBE是通過三種目前世界上最先進的膜厚測試技術來保證準確性：BPR(BeamProfileReflectometry)、BPE(BeamProfileEllipsometry)、VS(VisibleSpectrometry)。在整個系統(tǒng)中，OPTI-PROBE可以綜合利用上面三種技術獲得穩(wěn)定的測試結果，對于薄的膜層測試精度±1A,對于厚的膜層測試精度±2A士蘭特點：具有豐富的經(jīng)驗的測試應用工程師能提供各類復雜測試的解決方案。先進的設備性能以及國內(nèi)一流的技術團隊能最大程度地保證測試結果準確性。ADE9500介紹ADE’sUltraGage9500hasbecometheindustrystandardforwafergeometrycharacterizationforbothdevicefabsandsiliconwafermanufactures.Thesmallfootprint,noncontactmeasurementsandautomatedoperationcombinedwith10nmresolutionpositiontheUltraGageastheidealprocessdevelopment,analysisandcontroltoolforphotolithography,thinfilmstress,thermal,CMPandbackgrindprocesses.Measurements:Thickness,Flatness(Global&Site),Shape(Bow/Warp)Features:Non-contactmeasurements,10nmresolution,Patternedorpolishedwafers,Integralprealignment,ManualorcassetteoperationAccuracy:Thickness(±0.5um),flatness(±0.15um)BowandWarp(±3.0um+5%ofreading)SILANCharacteristicWecanaffordthebesttestresultofaccuracybytheseverestcalibrationmethodandourperfectlytechnology.ADE公司生產(chǎn)的UltraGage9500已經(jīng)成為硅片制造商和集成電路制造商