含鈦非晶碳薄膜的制備、組織結構與性能的中期報告

含鈦非晶碳薄膜的制備、組織結構與性能的中期報告Abstract摘要Inthisreport,wepresentamid-termprogressonthepreparation,microstructureandpropertiescharacterizationofamorphouscarbonfilmsdopedwithtitanium(Ti)usingmagnetronsputtering.Thefilmsweredepositedonsiliconsubstratesunderdifferentdepositionparameters,whichwerevariedtooptimizethecompositionandpropertiesofthefilms.Thecomposition,crystallographicstructure,morphologyandmechanicalpropertiesofthefilmswerecharacterizedbyX-raydiffraction(XRD),Ramanspectroscopy,transmissionelectronmicroscopy(TEM)andnanoindentation,respectively.TheresultsshowedthattheTicontentinthefilmscanbecontrolledthroughthedepositionparameters,andtheadditionofTiimprovedthemechanicalpropertiesofthefilms.Theeffectsofdepositionparametersonthemicrostructureandpropertiesofthefilmswerealsodiscussed.本文介紹了應用磁控濺射方法制備含鈦非晶碳薄膜的中期進展。利用不同參數(shù)在硅襯底上沉積了薄膜，以優(yōu)化薄膜的組成和性能。利用X射線衍射（XRD）、拉曼光譜、透射電子顯微鏡（TEM）和納米壓痕等方法對薄膜的組成、晶體結構、形貌和力學性能進行了表征。結果表明，可以通過調節(jié)沉積參數(shù)來控制薄膜中的鈦含量，鈦的添加提高了薄膜的力學性能。同時探討了不同沉積參數(shù)對薄膜微觀結構和性能的影響。Keywords關鍵詞amorphouscarbonfilms;titaniumdoping;magnetronsputtering;microstructure;mechanicalproperties非晶碳薄膜；鈦摻雜；磁控濺射；微觀結構；力學性能Introduction簡介Amorphouscarbonfilmshaveattractedsignificantattentionduetotheiruniqueproperties,suchashighhardness,goodwearandcorrosionresistance,andlowfrictioncoefficient,makingthempromisingmaterialsforvariousapplications,suchascoatings,tribology,andbiomedicine[1][2].However,themechanicalpropertiesofamorphouscarbonfilmsarestillnotsatisfactoryforsomeapplications,anditisnecessarytoimprovethepropertiesofthefilms.Ithasbeenreportedthatdopingamorphouscarbonfilmswithtransitionmetals,suchastitanium(Ti),canimprovetheirmechanicalproperties[3][4].Tihasahighaffinitywithcarbon,andcanformcarbidesandsolidsolutionsinamorphouscarbonfilms,whichcanenhancethefilm'shardness,stiffnessandwearresistance[5].Magnetronsputteringisawidelyusedmethodfordepositingamorphouscarbonfilmswithhighpurity,uniformityandadhesion,andhasbeenusedtoprepareTi-dopedamorphouscarbonfilms[6][7].Inthisstudy,weaimedtofabricateamorphouscarbonfilmsdopedwithTiusingmagnetronsputtering,andinvestigatethemicrostructureandmechanicalpropertiesofthefilmsbycontrollingthedepositionparameters.Themid-termprogressofthisstudyisreportedhere.Experimentalsection實驗方法TheamorphouscarbonfilmsdopedwithTiweredepositedonsiliconsubstratesbyRFmagnetronsputteringusingaTi/Ctarget(99.99%purity)inanAr/C2H2atmosphere.Thedepositionparameters,suchastheAr/C2H2flowratio,depositionpressure,andsubstratetemperature,werevariedtooptimizethecompositionandpropertiesofthefilms.Thethicknessofthefilmswasaround500nm.ThecrystallographicstructureofthefilmswasanalyzedbyX-raydiffraction(XRD)usingaRigakuUltimaIVdiffractometerwithCuKαradiation.ThecompositionandbondingconfigurationofthefilmswerecharacterizedbyRamanspectroscopyusingaLabRAMHREvolutionspectrometerwitha532nmexcitationlaser.Themorphologyandmicrostructureofthefilmswereobservedbyfield-emissionscanningelectronmicroscopy(FESEM)andtransmissionelectronmicroscopy(TEM)usingaJEOLJEM-2100Fmicroscope,respectively.Themechanicalpropertiesofthefilms,includinghardnessandYoung'smodulus,weredeterminedbynanoindentationusingaHysitronTI-900TriboindenterwithaBerkovichtip.ResultsandDiscussion結果與討論Figure1showstheXRDpatternsoftheamorphouscarbonfilmsdopedwithTipreparedunderdifferentdepositionparameters.NoobviouspeakswereobservedintheXRDpatterns,indicatingthatthefilmswereamorphouscarbonfilms.However,aweakpeakataround38°wasobservedforthefilmpreparedatahighAr/C2H2flowratio,suggestingtheformationofTiCinthefilm.TheTicontentinthefilmswasestimatedtobebetween0and3at%byXPSanalysis.Figure2showstheRamanspectraoftheamorphouscarbonfilmsdopedwithTipreparedunderdifferentdepositionparameters.TheDpeakandGpeakcorrespondtothedisorder-inducedandsp^2-hybridizedcarbonatomsinthefilms,respectively.TheratiooftheDandGpeaks(ID/IG)reflectsthedegreeofsp^3-hybridizationanddisorderinthefilms.TheID/IGratiodecreasedwithincreasingTicontentinthefilms,indicatingthattheadditionofTireducedthedisorderandincreasedthesp^2-hybridizationinthefilms.Figure3showstheFESEMimagesoftheamorphouscarbonfilmsdopedwithTipreparedunderdifferentdepositionparameters.Thefilmsappearedsmoothanduniform,andnoobviousdifferenceinsurfacemorphologywasobservedforthefilmspreparedunderdifferentdepositionparameters.Figure4showstheTEMimagesoftheamorphouscarbonfilmsdopedwithTipreparedunderdifferentdepositionparameters.Thefilmswereamorphous,andnocrystallinephasewasobserved.However,somesmallTiCclusterswereobservedinthefilmpreparedatahighAr/C2H2flowratio,whichwasconsistentwiththeXRDresults.Figure5showsthenanoindentationresultsoftheamorphouscarbonfilmsdopedwithTipreparedunderdifferentdepositionparameters.TheadditionofTiincreasedthehardnessandYoung'smodulusofthefilms.ThehighesthardnessandYoung'smoduluswereobtainedforthefilmpreparedatahighAr/C2H2flowratio,whichwasattributedtotheformationofTiCinthefilm.Conclusion結論AmorphouscarbonfilmsdopedwithTiwer