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DUVSCANNER&I-LINESCANNERSystemoverview1第1頁(yè)SCANNERFUNCTIONSFunctionGetsresist-coatedwafersfromtheTrackExposethewafersSendsthewafersbacktotheTrackfordevelopingThepatterntoexposeisonthereticle.Thescannerwillalignthereticlesothatthepatterncanbeexposedaccuratelyonthewafer.Someparameters:ExposureenergyandFocusExposureFieldP,EandDchucksPrimaryMakersAlignment2第2頁(yè)OVERVIEWOFSYSTEMDUVScannerI-lineScannerTheDUVscannersareconnectedtotheDUVTracks.ForcriticallayersTheI-linescannersareconnectedtotheI-linetracks.Fornon-criticallayers.3第3頁(yè)OVERVIEWOFSYSTEMD-chuckE-chuckP-chuckRobotInOut12344第4頁(yè)OVERVIEWOFFUNCTIONSSequenceofeventsEdgePre-alignmentOpticalPre-alignmentGlobalAlignmentExposureDischarge5第5頁(yè)EDGEPRE-ALIGNMENT

WhatisEdgePre-alignment??DuringEdgePre-alignment,thescannerlooksforthenotchonthewafer.Thiswilltellthemachinetheorientationofthewafer.ThisistoenablethemachinetoplacethewaferaccuratelyontheP-chuck. Howdoesitwork??ThewaferisrotatedunderalaserbeamalongtheedgeThebeamwillsearchforthenotchatthewaferedge WhydoweneedEdgePre-alignment?SothatthewaferwillbeplacedaccuratelyontheP-chuck.6第6頁(yè)OPTICALPRE-ALIGNMENT

WhatisOpticalPre-alignment?AsensorlooksforthePrimaryMarkersonthewafer.ThisimprovestheaccuracyoftheEdgePre-alignment Howdoesitwork??Thewaferisrotatedunderaopticalsensor.Thesensorwilllookforthe2Primary Markersonthewafer WhydoweneedOpticalPre-alignment??ThisimprovestheaccuracyoftheEdgePre-alignment.7第7頁(yè)GLOBALALIGNMENT

WhatisGlobalAlignment??Duringglobalalignment,thewaferisveryaccuratelyaligned.Thereticleisalsoaligned.GlobalAlignmentisdoneontheP-Chuck Howdoesitwork??ThescannerwillalignusingthePrimaryMarkersonthewafer WhydoweneedGlobalAlignmentThisisthefinalalignmentbeforeexposure.Thisensuresthatthereticleisalsoalignedbeforeexposure.Thisisveryimportantforgoodoverlay!8第8頁(yè)THISISWHATHAPPENSWHENALIGNMENTISNOTDONEPROPERLYThecurrentlayerisnotpositioneddirectlyoverthepreviouslayers9第9頁(yè)SOMEMOREEXAMPLESThecurrentlayerisnotpositioneddirectlyoverthepreviouslayers10第10頁(yè)EXPOSURE

WhatisExposure??Duringexposure,thepatternonthereticleistransferredtothewafer.Thescannerusesalaserorlighttoexposethepatternonthephoto-sensitiveresist. Howdoesitwork?ThewaferisplacedontheE-Chuck.ThereticleisplacedontheReticleStage.TheWaferStagemovestogetherwiththeReticleStageinoppositedirectionstoexposethepattern11第11頁(yè)EXPOSUREThepatternisexposedmanytimesoverthewholewaferEachexposureiscalleda“exposurefield”,asshownbytheredsquareNormally,thereareabout>60fieldsperwaferEachfieldwillcontainmanydiedesigns.12第12頁(yè)EXPOSUREThisis1reticlefield.Thisreticlehas6x4diesinthedesign.13第13頁(yè)DISCHARGEAfterthew

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