switchable resistance change of crdoped srtio3 thin films grown _第1頁(yè)
switchable resistance change of crdoped srtio3 thin films grown _第2頁(yè)
switchable resistance change of crdoped srtio3 thin films grown _第3頁(yè)
switchable resistance change of crdoped srtio3 thin films grown _第4頁(yè)
switchable resistance change of crdoped srtio3 thin films grown _第5頁(yè)
已閱讀5頁(yè),還剩79頁(yè)未讀 繼續(xù)免費(fèi)閱讀

下載本文檔

版權(quán)說(shuō)明:本文檔由用戶提供并上傳,收益歸屬內(nèi)容提供方,若內(nèi)容存在侵權(quán),請(qǐng)進(jìn)行舉報(bào)或認(rèn)領(lǐng)

文檔簡(jiǎn)介

1、Fifth Asian-European InternationalConference on Plasma Surface Engineering Final ProgrammeAEPSE 2005 September 12-16, 2005 Qingdao City (China)Organized and Sponsored byTsinghua UniversityShandong UniversityQingdao University of Science and TechnologyNational Natural Science Foundation of ChinaThe E

2、uropean Joint Committee on Plasma and Ion Surface EngineeringEuropean Society of Thin Films HYPERLINK :/ :/ Scope of AEPSE 2005 The fifth Asian-European International Conference on Plasma Surface Engineering (AEPSE 2005) will be held from Monday,

3、 September 12 to Friday, September 16, 2005, in Qingdao City, China. The conference is organized and sponsored by Tsinghua University, Shandong University, Qingdao University of Science and Technology, National Natural Science Foundation of China, European Society of Thin Films and the European Join

4、t Committee on Plasma and Ion Surface Engineering.Rapid progress on coatings and films and functional surface treatments by utilizing plasma and energetic beam has been made in research and development for various industrial applications in recent years. It is the aim of the AEPSE conference to prov

5、ide an open forum to discuss the state of the art and a perspective of scientific and technological achievement in plasma generation, diagnostics, films and coating materials, advanced plasma processing, functional surface treatment and applications.In addition to the conference, the industrial plas

6、ma technology exhibition will be organized during the conference. The industry exhibition will cover broad industrial sectors, and can be of general interest for researchers in academia and industry. The perspective of plasma technology development and application for next generation nano-technology

7、, information and telecommunication technology, bio-technology, energy and environmental technology will also be addressed both in the conference and in the exhibition.Conference ChairmanF. Z. Cui (CN)Conference Co-Chairmen G. Bruer (DE)J. G. Han (KR)K. M. Wang (CN)Secretary GeneralZ. L. Cui (CN)R.

8、Lahaye (NL)H. H. Tong (CN)International Advisory CommitteeR. Itatani (JP)H. D. Li (CN)A. Matthews (GB)K.-T. Rie (DE)C. K. Wu (CN)International Organizing CommitteeG. Bruer (DE)A. Cavaleiro (PT)Paul K. Chu(HK)F. Z. Cui (CN)H. Fujiyama (JP)K. Kadyrzhanov (KZ)A. S. Korhonen (FI)S. C. Kwon (KR)M. Lattem

9、ann (SE)S. Mukherjee (IN)J. Musil (CZ)H. Oechner (DE)F. Pan (CN)A. Pogrebnjak (UA)O. Takai (JP)M. Topic (SA)T. Vilaithong (TH)L. S. Wen (CN)S. Xu (SG)B. S. Xu (CN)T. Yoshida (JP)K. Zdunek (PL)International Scientific and Technical CommitteeJ. H. Boo (KR)C. Dong (CN)G. Erkens (DE)H. Ghasemi (IR)R. Gr

10、uen (DE)M. Hori (JP)P. E. Hovsepian (UK)N. K. Huang (CN)T. Kurg (NL)I-S. Lee (KR)J. J. Lee (KR)M. K. Lei (CN)W. T. Li (AU)B. X. Liu(CN)J. R. Liu (US)J. Mahrholz (DE)Miran Mozetic (SL)X. Nie (CA)Y. K. Pu (CN)Y. Setsuhara (JP)H. S. Uhm (KR)R. H. Wei (US)C. S. Wong (MY)Z. Xu (CN)Z. K. Zhang (CN)Local O

11、rganizing CommitteeG. A. Cheng (BNU)X. N. Cheng (JSU)F. L. Du (QDUST)Y. Gao (TYSTU)Y. Han (XJTU)Y. S. Huang (SCUT)X. Y. Le (BUAA)D. J. Li (TNU)C. Liu (WHU)F. Lu (SDU)B. Ma (IP, CAS)M. Pu (NNSFC)Z. X. Ren (IPP, CAS)Y. Shi (WHU)Y. L. Shi (QDUST)X. L. Wang (SDU)C. L. Zheng (NUJT)Editorial BoardG. Bruer

12、 (DE)A. Cavaleiro (PT)F. Z. Cui (CN)R. Lahaye (NL)A. Matthews (GB)K. M. Wang (CN)Conference SecretaryDr. X. D. SunTel: +86-10-62772977Fax:+86-10-62772850E-mail: HYPERLINK mailto: Dr. X. L. Wang (exhibition)Tel: +86-531-88364655Fax:+86-531-885651

13、67E-mail: HYPERLINK mailto: European secretaryMs. Antje SchmidtGostritzer Str. 61-63D-01217 DresdenGermanyTel: +49-351-871-8372Fax:+49-351-871-8431Email: HYPERLINK mailto: 9:00-9:30OpeningOpening CeremonyF. Z. Cui, Conference Chairman

14、Welcome AddressMayor of Qingdao City9:30-9:50Photo TimeTake photo of all participantsPlenary SessionSession Chairman: G. Bruer (Germany)Keming Wang (China)9:50-10:30Plenary lecture (P1)NEW APPROACHES TO PLASMA ENHANCED SPUTTERING OF ADVANCED HARD COATINGSGeorg ErkensGlobal Competence Network, Wursel

15、en (Germany)10:30-11:10Plenary lecture (P2)HAIERS TECHNOLOGICAL INNOVATION IN THE INTERNATIONAL PROMOTION FRAMEWORKZida YuHaier Group, Qingdao (China)11:10-11:50Plenary lecture (P3)RADICAL-CONTROLLED PLASMA NANO PROCESSESMasaru HoriDepartment of Electrical Engineering and Computer Science, Graduate

16、School of Engineering, Nagoya University, Nagoya (Japan)11:50-12:30Plenary lecture (P8)Nano-crystalline Carbon Film Design and Synthesis by Advanced Magnetron SputteringJeon G. HanCenter for Advanced Plasma Surface Technology School of Materials Science and Engineering Sungkyunkwan Univeristy (Korea

17、)13:30-17:30VisitingCourse A City Tour:Xinhaoshan Hill Park, Pier, Badaguan (eight passes) Scenic Area, Tsingtao Beer MuseumCourse BMount.Lao Tour:Stone Old Man, Taiqing Palace, Tianqing Gulf18:30-21:00Meeting of Organizing CommitteePlenary SessionSession Chairman: Jeon G. Han (Korea) Honghui Tong (

18、China)08:30-09:10Plenary lecture (P4)INDUSTRIAL APPLICATION OF ION BEAM ASSISTED DEPOSITION ON MEDICAL IMPLANTSIn-Seop LeeInstitute of Physics & Applied Physics, and Atomic-scale Surface Science Research Center, Yonsei University, Seoul (Korea)09:10-9:50Plenary lecture (P5)EFFECT OF WALL REFLECTION

19、ON OES IN INDUCTIVELY COUPLED PLASMASYi-Kang PuDepartment of Engineering Physics, Tsinghua University, Beijing (China)9:50-10:05Coffee BreakSession: Electronic functional coatingsSession Chairman: Chuang Dong (China)Holger Hoche (Germany)10:05-10:35Session LectureS1METAL-DOPED ZnO THIN FILMS : SYNHT

20、HESIS BY MAGNETRON SPUTTERING, CHATACTERIZATION, AND APPLICATION TESTS AND PERSPECTIVESSeong Hun Jeong, Bit Na Park, Soon-Bo Lee and Jin-Hyo BooDepartment of Chemistry and Center for Advanced Plasma Surface Technology, Sungkyunkwan University, Suwon (Korea)10:35-10:55WeAa1FIELD EMISSION PROPERTIES O

21、F CARBON NANOTUBES SYNTHESIZED BY ATMOSPHERIC PRESSURE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION AT LOW TEMPERATURE Se-Jin Kyung, Yong-Hyuk Lee, Voronko Maksym, June-Hee Lee, and Geun-Young YeomDept. of Materials Sci. & Eng., Sungkyunkwan Univ., Suwon (Korea)10:55-11:15WeAa2CONTROLLING THE OPTIMIZE

22、DEPOSITION OF THIN FILM IN D.C PLASMA MAGNETRON SPUTTERING AND MEASURING THE SURFACE CONDUCTIVITY BY HALL EFFECTF.Bahadori and M.MahmoudzadehPlasma Physics Department, METU, Ankara (Turkey)11:15-11:35WeAa3SPECTRALLY SELECTIVE COATINGS PRODUCED BY DC MAGNETRON SPUTTERINGShuxi ZhaoDept. of Mater. Sci.

23、, Division of Solid State Physics, Uppsala Univ., Uppsala (Sweden)11:35-11:55WeAa4STEALING COATING OF COIL CARBON FIBERS SYNTHESAZED BY ACETYLENE POLYMERIZATION WITH NANO-COPPER PARTICLES PREPARED BY ARC PLASMA Zuolin Cui, and Zhikun ZhangQindao Key Laboratory of nanotechnology, Qingdao University o

24、f Science &Technology (China)11:55-12:15WeAa5Preparation of Porous Complex Ceramic Coatings on Aluminium alloys and its Infrared and Radar Multifunctional Stealth PropertiesHonghui Tong and F. Y. JinSouthwestern Institute of Physics, Chengdu (China)8:30-9:50Plenary Session (See Page 5, Ballroom II)9

25、:50-10:05Coffee BreakSession: Plasma processing and surface treatmentSession Chairman: Albano Cavaleiro (Portugal)Shengli Ma (China)10:05-10:35Session LectureS2MULTIFUNCTIONAL FILMS FOR TEMPERATURE SENSITIVE MATERIALS PREPARED BY PACVD USING METAL ORGANIC PRECURSORSJ. Mahrholz 1, T. Hosenfeldt 2, K.

26、-T. Rie11Institut fr Oberflchentechnik (IOT), Technische Universitt Braunschweig (Germany)2INA-SCHAEFFLER KG, Industriestrae, Herzogenaurach (Germany)10:35-11:05Session LectureS4IPD. IMPULSE PLASMA DEPOSITION METHOLD Krzysztof ZdunekFaculty of Materials Science, Warsaw University of Technology Warsa

27、 (Poland)11:05-11:35Session LectureS6STUDY OF METAL FILM/SUBSTRATE MIXING BY INTENSE PULSED ION BEAM S. Yan1, X.Y. Le2, W. J. Zhao1, Y. J.Shang 1, Wang Yugang1, Xue Jianmin11Institute of Heavy Ion Physics, and Key Laboratory of Heavy Ion Physics, Ministry of Education, Beijing (China)2Department of

28、Applied Physics, School of Science, Beihang University, Beijing (China)11:35-11:55WeBa1SURFACE OXIDATION OF Al MASKS FOR DEEP DRY-ETCH OF SILICA OPTICAL WAVEGUIDESWei-Tang Li, and Rod BoswellPlasma Research Laboratory, Research School of Physical Sciences and Engineering, The Australian National Uni

29、versity (Australia)11:55-12:15WeBa2DUPLEX TREATMENTS OF PLASMA NITROCARBURIZING AND POST-OXIDATION IN AN ADIABATIC PLASMA FURNACECheng Zhao, Dingguo SunSurface Engineering Laboratory, Qingdao University of Science and Technology, Qingdao (China)8:30-9:50Plenary Session (See Page 5, Ballroom II)9:50-

30、10:05Coffee BreakSession: Thin film and coating modeling and analysisSession Chairman: Hiroshi Fujiyama (Japan)Xiaoyun Le (China)10:05-10:35Session LectureS3THIN FILM GROWTH ON 3-DIMENSIONAL SUBSTRATES USING HIGHLY IONIZED PVDM. Lattemann, J. Bhlmark, J. Alami, U. HelmerssonIFM Material Physics, Div

31、ision of Plasma & Coatings Physics, Linkping University (Sweden)10:35-11:05Session LectureS5HIGH-RATE GROWTH OF HIGH-QUALITY MICROCRYSTALLINE SILICON FILMS FROM PLASMA BY INTERCONNECTED MULTI-HOLLOW CATHODEChisato Niikura1, Naho Itagaki2, and Akihisa Matsuda31International Center for Young Scientist

32、s, National Institute for Materials Science (Japan)2National Institute of Advanced Industrial Science and Technolog,(Japan)3Research Institute for Science and Technology, Tokyo University of Science (Japan)11:05-11:35Session LectureS7ANALYTICAL TRANSMISSION ELECTRON MICROSCOPY OF THE WEAR MECHANISMS

33、 OF NANO-STRUCTURED MULTILAYER COATINGS TiAlN/VN AND TiAlN/CrNQ. Luo1, Z. Zhou2, W.M. Rainforth2, P. Eh. Hovsepian11Materials and Engineering Research Institute, Sheffield Hallam University (UK)2Department of Engineering Materials, University of Sheffield (UK)11:35-11:55WeCa1POLYMERIC FLUOROCARBON F

34、ILMS DEPOSITED ON POLYIMIDE SUBSTRATE BY RF MAGNETRON SPUTTERING PTFEHongjin Qi1, Jianfeng Di1, Yuhui Zhang2, Wenqin Du11Department of Textile Engineering and Clothing, Wuyi University, Jiangmen (China) 2Institute of Chemical engineering, Qingdao university, Qingdao (China) Session: Tribological and

35、 protective coatingsSession Chairman: Bert Scheffel (Germany)Yulong Shi (China)13:30-14:00Session LectureS8OXIDATION BEHAVIOR OF SPUTTERED CrN/AlN MULTILAYER COATINGSShih-Kang Tien1, Jenq-Gong Duh1 and Su-Yueh Tsai21Dept. Materials Science and Engineering, National Tsing Hua University, Hsinchu (Tai

36、wan)2Precision Instrument Center, National Tsing-Hua University, Hsinchu (Taiwan)14:00-14:30Session LectureS11ENHANCING THE DUCTILITY OF CORROSION RESISTANT PVD-COATINGS DEPOSITED ON MAGNESIUM ALLOYS TO ENSURE SUFFICIENT WEAR PROPERTIESH. Hoche, E. Broszeit, C. BergerInstitute of Materials Technolog

37、y & State Testing Institute for Materials Darmstadt, Technical University Darmstadt (Germany)14:30-14:50WeAb1PROPERTIES OF Si/C/N:H-FILMS FOR WEAR AND CORROSION PROTECTION D. Probst1, Y. Zhou2, R. Hauser2, T. Stelzner3, H. Hoche1, H. Scheerer1, E. Broszeit1, C. Berger1 1Institute of Materials Techno

38、logy, Darmstadt University of Technology, Darmstadt (Germany)2Department for Disperse Solids, Darmstadt University of Technology, Darmstadt (Germany)3Institute for Physical High Technology, Jena (Germany)14:50-15:10WeAb2FRICTION AND WEAR BEHAVIOUR OF CrN COATING AT TEMPERATURES UP TO 500 oCT. Polcar

39、1, R. Novk2, P. irok31Department of Applied Mathematics, Faculty of Transportation Sciences, CTU in Prague (Czech Republic) 2Department of Physics, Faculty of Mechanical Engineering, CTU in Prague (Czech Republic)3HVM Plasma Ltd. (Czech Republic)15:10-15:30WeAb3THE FRICTION-REDUCTION MODEL OF THE IR

40、ON SULFIDE FILM PREPARED BY PLASMA SOURCE ION SULFURATION Wang Hai-dou1, Xu Bin-shi1, Liu Jia-jun2, Zhuang Da-ming21National Key Lab for remanufacturing, Academy of Armored Forces Engineering, Beijing (China)2Department of Mechanical Engineering, Tsinghua University, Beijing (China)15:30-15:50WeAb4E

41、FFECT OF CARBON CONTENT AND ANNEALING TEMPERATURE ON THE MICROSTRUCTURE AND HARDNESS OF SUPERHARD Ti-Si-C-N NANOCOMPOSITE COATINGS PREPARED BY PULSED D.C. PCVDYan Guo, Genrong Chang, Shengli Ma, Kewei XuState-Key Laboratory for Mechanical Behavior of Materials, Xian Jiaotong University, Xian (China)

42、15:50-16:10WeAb5CrN/BCN NANO-MULTILAYER PVD COATING FOR ANTI-WEAR AND LOW FRICTION APPLICATIONSK. Yamamoto1, Hirotaka Ito1, S. Kujime21Materials Research lab., Kobe Steel Ltd. (Japan)2Advanced Products & Technologies Dept., Kobe Steel Ltd. (Japan)16:10-16:30WeAb6THE EFFECT OF THERMAL BARRIER COATING

43、S ON DIESEL ENGINE PERFORMANCEImdat Taymaz Faculty of Engineering, University of Sakarya, Esentepe Kampusu, Adapazar (Turkey)Session: Electronic functional coatingsSession Chairman: Masayuki Kuzuya (Japan)P. Tsai (Taiwan)16:30-16:50WeAc1EFFECTIVE ELECTRODE WORK FUNCTIONS IN ARGON GAS TUNGSTEN ARC DU

44、RING OPERATIONM. Tanaka1, S. Tashiro1, M. Ushio1, M. Ikeuchi2 and Y. Kagebayashi21Joining and Welding Research Institute, Osaka University, Osaka (Japan)2Lamp Technology & Engineering Division, USHIO INC., Hyogo (Japan)16:50-17:10WeAc2FABRICATION OF CARBON NANOTUBE FIELD EMISSION CATHODE WITH SILVER

45、 NANO-PARTICLES AT 140 Haiyan Li1, Zhisheng Zhang1, Ming Hu1, Shen Cui2, Xiuyu Wang1, Yugong Wu11Department of Electronics Science and technology, School of Electronics Information Engineering, Tianjin University, Tianjin (China)2Department of Chemistry, School of Science, Tianjin University, Tianji

46、n (China)17:10-17:30WeAc3DIELECTRIC PROPERTIES OF FREESTANDING DIAMOND FILMSZ. L. Wang, Z. H. Sun, Y. L. Li, Q. Wang, Q. Luo, B. L. Cheng, C. Z. GuBeijing National Laboratory for Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences, Beijing (China)17:30-17:50WeAc4MeV ION IRRAD

47、IATION EFFECT IN NANOPARTICLES FORMATION BY ION BEAMS Jiarui Liu, I. Rusakova, Xuemei Wang, Hui Chen, X.K.Yu and Wei-Kan ChuTexas Center for Superconductivity at University of Houston (TCSUH) and Department of Physics, University of Houston, Houston , Texas (USA)17:50-18:10WeAc5FLEXIBLE AR COATINGS

48、BY FACE-TO-FACE SYMMETRIC MAGNETRON SPUTTERINGCheng-Shih Wang1, Takahiro Mizukami1, Kimihiro Sasaki1, and Tomonobu Hata21Graduate School of Natural Science & Technology, Kanazawa University, Kanazawa (Japan)2Innovation Plaza Ishikawa, Japan Science and Technology Agency, Ishikawa (Japan) Session: Pl

49、asma processing and surface treatmentSession Chairman: Tomas Kurg (the Netherlands)Kelvin Yeung (Hong Kong)13:30-14:00Session LectureS9DOUBLE GLOW PLASMA SURFACE ALLOYING AND PLASMA NITRIDINGZhong Xu1,2, Ping-ze Zhang2, Gao-hui Zhang1, Yan-mei Zhang1, Zhi-yong He11Taiyuan University of Science and T

50、echnology (China)2Nanjing University of Aviation and Airspace (China)14:00-14:30Session LectureS12PULSED SPUTTER-COATING OF INSIDE WALL OF NARROW TUBE BY THE 2ND HARMONIC ECR PLASMASH. Fujiyama1, H. Uchida1, M. Kumamoto1, Y. Nitta1, T. Nakatani1, M. Shinohara2 and Y. Matsuda21Graduate school of Scie

51、nce and Technology, Nagasaki University (Japan)2Department of Electrical and Electronic Engineering, Nagasaki University (Japan)14:30-14:50WeBb1DEPOSITION OF CARBON NANOFIBERS UPON LOW CARBON STEEL SUBSTRATE BY USING OXY-ACETYLENE REDUCING FLAME METHOD Shumei Lei1, Tongchun Kuang1, Xiaoling Cheng21A

52、nalytical and Testing Center, South China University of Technology, Guangzhou (China) 2Analytical and Testing Center, Guangdong University of Technology, Guangzhou (China)14:50-15:10WeBb2APPLICATION OF OES IN ORIENTATION CONTROLLING OF DIAMOND FILMS DEPOSITED BY DC ARC PLASMA JET CVDZ.Y. Zhou, G.C.

53、Chen, W.Z. Tang, F.X. Lu, C.M. Li, J.H. SongSchool of Materials Science and Engineering, University of Science and Technology Beijing, Beijing (China)15:10-15:30WeBb3SURFACE MODIFICATION OF POLYDIMETHYLSILOXANE BY CF4 PLASMA TREATMENT AND EFFECT OF FILLERSYehai Yan, Mary Bee Eng Chan-ParkSchool of C

54、hemical and Biomolecular Engineering, Nanyang Technological University (Singapore) 15:30-15:50WeBb4DETECTION OF SHOCKS GENERATED BY INTENSE PULSED ION BEAM IRRADIATIONXiaoyun Le1, Sha Yan2, Zhijian Liu1, Weijiang Zhao21Department of Applied Physics, School of Science, Beijing University of Aeronauti

55、c and Astronautic, Beijing (China)2Institute of Heavy Ion Physics, and Key Laboratory of Heavy Ion Physics, Ministry of Education, Beijing (China)15:50-16:10WeBb5Cr-DOPED DLC FILMS IN THREE MID-FREQUENCY DUAL-MAGNETRON SPUTTERING MODES Yu Xiang1, Liu Yang2, Wang Cheng-biao1, Ren Zhao-Xing3, Yu De-ya

56、ng21School of Engineering and Technology, China University of Geosciences, Beijing (China)2Beijing Powertech Co. Ltd., Beijing (China)3Institute of Plasma Physics, China Academy of Sciences, Hefei (China)16:10-16:30WeBb6Hard thick-film and wear resistance of Al-50Si-10M ternary alloys on A6063 alumi

57、num alloy substrate coated by low pressure plasma sprayingZhixin Kang, Kazuhiro Nakatab, Yuanyuan LiGuangdong Key Laboratory for Advanced Metallic Materials Processing, South China University of Technology (China)Session: Advanced plasma sources and diagnosticsSession Chairman: Krzysztof Zdunek (Pol

58、and)Chuanlin Zheng(China)16:30-16:50WeBc1LOW-PRESSURE MICRO PLASMA GENERATION USING MICROWAVE IN A MAGNETIC FIELDY. Furue, D. Kurogi, H. Inoue and H. FujiyamaGraduate school of Science and Technology, Nagasaki University (Japan)16:50-17:10WeBc2THEORETICAL MODEL OF DIFFUSION AND PHASE TRANSFORMATIONS

59、 IN LAMELLAR SYSTEMS FOR HIGH TEMPERATURE APPLICATIONK.K.Kadyrzhanov1,V.S.Rusakov2, T.E.Turkebaev1, .Zhankadamova11Institute of Nuclear Physics NNC RK, Almaty (Kazakhstan)2Moscow State University, Moscow (Russia)17:10-17:30WeBc3PLASMA BEHAVIOR OF PULSE-BIAS ARC DEPOSITION Guoqiang Lin, Dong Qi, Jial

60、iang Zhang, Zhenzhong Sui, Yanhui Zhao, Lishi Wen, Chuang Dong State Key Laboratory of Materials Modification, Dalian Univ. of Technology, Dalian (China)17:30-17:50WeBc4PLASMA CHARACTERISTICS IN INDUCTIVELY COUPLED PLASMA SOURCE USING DUAL FREQUENCYK.N. Kim, C. K. Oh, and G.Y. Yeom,Dept. of Material

溫馨提示

  • 1. 本站所有資源如無(wú)特殊說(shuō)明,都需要本地電腦安裝OFFICE2007和PDF閱讀器。圖紙軟件為CAD,CAXA,PROE,UG,SolidWorks等.壓縮文件請(qǐng)下載最新的WinRAR軟件解壓。
  • 2. 本站的文檔不包含任何第三方提供的附件圖紙等,如果需要附件,請(qǐng)聯(lián)系上傳者。文件的所有權(quán)益歸上傳用戶所有。
  • 3. 本站RAR壓縮包中若帶圖紙,網(wǎng)頁(yè)內(nèi)容里面會(huì)有圖紙預(yù)覽,若沒(méi)有圖紙預(yù)覽就沒(méi)有圖紙。
  • 4. 未經(jīng)權(quán)益所有人同意不得將文件中的內(nèi)容挪作商業(yè)或盈利用途。
  • 5. 人人文庫(kù)網(wǎng)僅提供信息存儲(chǔ)空間,僅對(duì)用戶上傳內(nèi)容的表現(xiàn)方式做保護(hù)處理,對(duì)用戶上傳分享的文檔內(nèi)容本身不做任何修改或編輯,并不能對(duì)任何下載內(nèi)容負(fù)責(zé)。
  • 6. 下載文件中如有侵權(quán)或不適當(dāng)內(nèi)容,請(qǐng)與我們聯(lián)系,我們立即糾正。
  • 7. 本站不保證下載資源的準(zhǔn)確性、安全性和完整性, 同時(shí)也不承擔(dān)用戶因使用這些下載資源對(duì)自己和他人造成任何形式的傷害或損失。

最新文檔

評(píng)論

0/150

提交評(píng)論